Our
state-of-the-art infrastructure combines advanced magnetron sputtering systems,
electron beam and thermal evaporation systems as well as atomic layer
deposition capabilities.
This
includes our flagship , an EPSRC
capital investment facility at ֲýƵ, purpose-built to produce
high-quality thin films with minimal impurities and defects for commercial and
academic applications.
Our state-of-the-art
infrastructure combines advanced magnetron sputtering systems with integrated
characterisation capabilities, all housed within three specialised deposition
laboratories featuring both chemical and physical vapour deposition technologies.
The flagship TF-FAB system features dual chambers with four magnetrons, fast
pumping and venting for exceptional turnaround times, and multiple power supply
modes that enable diverse deposition processes across numerous applications.
In-situ optical emission monitoring and sputtering bias capabilities provide
unmatched flexibility and precision in controlling film stoichiometry and
structure.
Our dedicated technical team works closely with each client - whether
SMEs, large multinationals, or academic researchers - to define requirements,
design optimal deposition processes, and deliver tailored solutions from sample
preparation through final analysis.
Find out more about our facility via the video and links below. If you would like to submit an enquiry please contact us and we'll be in touch as soon as we can.
